• Home
  • About
  • Contact
  • Products
    • All
    • Selective Wet Etching
    • Post-DE Residue Removal
    • Post CMP Cleaners
    • Pattern Collapse Solution
  • FAQ
  • More
    • Home
    • About
    • Contact
    • Products
      • All
      • Selective Wet Etching
      • Post-DE Residue Removal
      • Post CMP Cleaners
      • Pattern Collapse Solution
    • FAQ
  • Home
  • About
  • Contact
  • Products
    • All
    • Selective Wet Etching
    • Post-DE Residue Removal
    • Post CMP Cleaners
    • Pattern Collapse Solution
  • FAQ

PIONEERING CHEMICAL INNOVATION FOR THE FUTURE OF COMPUTING

OUR MISSION

At the forefront of chemical formulations R&D, we develop advanced materials and high precision selective chemistries that power the semiconductor industry’s next generation devices. Our innovations enable the miniaturization, performance, and efficiency demanded by future computing technologies. Partnering with industry leaders, we turn bold ideas into scalable solutions—driving progress at the atomic scale.

ABOUT US

M-R Advanced Technologies is committed to customer satisfaction and strives to exceed your expectations. We are dedicated to providing cutting-edge solutions that drive efficiency and excellence in every aspect of your business. Our customer-specific formulations reduce product develop time and processing cost. 

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A FEW SELECT CUSTOMERS

  

We partner with leading semiconductor manufacturers to deliver high-performance chemistries and strategies for Selective Wet Etching, Post DE Residue Removal, Post CMP Cleaners, and Pattern Collapse Prevention that enable the next generation of devices. Our formulations are engineered to deliver precision, consistency, and reliability in the most demanding process environments


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